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Nano Lett. 2014 Feb 12;14(2):464-72. doi: 10.1021/nl4033704. Epub 2014 Jan 29.

Role of the seeding promoter in MoS2 growth by chemical vapor deposition.

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Department of Electrical Engineering and Computer Sciences, Massachusetts Institute of Technology , Cambridge, Massachusetts 02139, United States.


The thinnest semiconductor, molybdenum disulfide (MoS2) monolayer, exhibits promising prospects in the applications of optoelectronics and valleytronics. A uniform and highly crystalline MoS2 monolayer in a large area is highly desirable for both fundamental studies and substantial applications. Here, utilizing various aromatic molecules as seeding promoters, a large-area, highly crystalline, and uniform MoS2 monolayer was achieved with chemical vapor deposition (CVD) at a relatively low growth temperature (650 °C). The dependence of the growth results on the seed concentration and on the use of different seeding promoters is further investigated. It is also found that an optimized concentration of seed molecules is helpful for the nucleation of the MoS2. The newly identified seed molecules can be easily deposited on various substrates and allows the direct growth of monolayer MoS2 on Au, hexagonal boron nitride (h-BN), and graphene to achieve various hybrid structures.

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