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Opt Lett. 2013 Dec 1;38(23):5067-70. doi: 10.1364/OL.38.005067.

Terahertz wire grid polarizer fabricated by imprinting porous silicon.

Abstract

A terahertz (THz) wire-grid polarizer is fabricated by imprinting porous Si followed by oblique evaporation of Ag. We demonstrate that it works in a wide frequency region covering from 5 to 18 THz with the extinction ratio of 10 dB. The frequency region is much wider than that of THz wire-grid polarizers fabricated by conventional imprint lithography using organic materials. The result suggests that imprinting of porous Si is a promising fabrication technique to realize low-cost wire-grid polarizers working in the THz region.

PMID:
24281511
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