Negative plasma potential relative to electron-emitting surfaces

Phys Rev E Stat Nonlin Soft Matter Phys. 2013 Sep;88(3):033103. doi: 10.1103/PhysRevE.88.033103. Epub 2013 Sep 9.

Abstract

Most works on plasma-wall interaction predict that with strong electron emission, a nonmonotonic "space-charge-limited" (SCL) sheath forms where the plasma potential is positive relative to the wall. We show that a fundamentally different sheath structure is possible where the potential monotonically increases toward a positively charged wall that is shielded by a single layer of negative charge. No ion-accelerating presheath exists in the plasma and the ion wall flux is zero. An analytical solution of the "inverse sheath" regime is demonstrated for a general plasma-wall system where the plasma electrons and emitted electrons are Maxwellian with different temperatures. Implications of the inverse sheath effect are that (a) the plasma potential is negative, (b) ion sputtering vanishes, (c) no charge is lost at the wall, and (d) the electron energy flux is thermal. To test empirically what type of sheath structure forms under strong emission, a full plasma bounded by strongly emitting walls is simulated. It is found that inverse sheaths form at the walls and ions are confined in the plasma. This result differs from past particle-in-cell simulation studies of emission which contain an artificial "source sheath" that accelerates ions to the wall, leading to a SCL sheath at high emission intensity.

Publication types

  • Research Support, U.S. Gov't, Non-P.H.S.