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Nanoscale Res Lett. 2013 Aug 8;8(1):349. doi: 10.1186/1556-276X-8-349.

Uniform SiGe/Si quantum well nanorod and nanodot arrays fabricated using nanosphere lithography.

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  • 1Institute of Materials Science and Engineering, National Central University, No, 300, Jhongda Rd,, Jhongli 32001, Taoyuan, Taiwan. swlee@ncu.edu.tw.

Abstract

This study fabricates the optically active uniform SiGe/Si multiple quantum well (MQW) nanorod and nanodot arrays from the Si0.4Ge0.6/Si MQWs using nanosphere lithography (NSL) combined with the reactive ion etching (RIE) process. Compared to the as-grown sample, we observe an obvious blueshift in photoluminescence (PL) spectra for the SiGe/Si MQW nanorod and nanodot arrays, which can be attributed to the transition of PL emission from the upper multiple quantum dot-like SiGe layers to the lower MQWs. A possible mechanism associated with carrier localization is also proposed for the PL enhancement. In addition, the SiGe/Si MQW nanorod arrays are shown to exhibit excellent antireflective characteristics over a wide wavelength range. These results indicate that SiGe/Si MQW nanorod arrays fabricated using NSL combined with RIE would be potentially useful as an optoelectronic material operating in the telecommunication range.

PMID:
23924368
PMCID:
PMC3765112
DOI:
10.1186/1556-276X-8-349
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