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Nano Lett. 2013 Sep 11;13(9):4275-9. doi: 10.1021/nl4020414. Epub 2013 Aug 23.

Graphene metallization of high-stress silicon nitride resonators for electrical integration.

Author information

1
Department of Electrical Engineering , Columbia University , New York, New York 10027, United States.

Abstract

High stress stoichiometric silicon nitride resonators, whose quality factors exceed one million, have shown promise for applications in sensing, signal processing, and optomechanics. Yet, electrical integration of the insulating silicon nitride resonators has been challenging, as depositing even a thin layer of metal degrades the quality factor significantly. In this work, we show that graphene used as a conductive coating for Si3N4 membranes reduces the quality factor by less than 30% on average, which is minimal when compared to the effect of conventional metallization layers such as chromium or aluminum. The electrical integration of Si3N4-Graphene (SiNG) heterostructure resonators is demonstrated with electrical readout and electrostatic tuning of the frequency by up to 0.3% per volt. These studies demonstrate the feasibility of hybrid graphene/nitride mechanical resonators in which the electrical properties of graphene are combined with the superior mechanical performance of silicon nitride.

PMID:
23905749
DOI:
10.1021/nl4020414
[Indexed for MEDLINE]

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