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Nanotechnology. 2013 Aug 16;24(32):325301. doi: 10.1088/0957-4484/24/32/325301. Epub 2013 Jul 17.

Mold cleaning with polydimethylsiloxane for nanoimprint lithography.

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1
Nanodevices and Integrated Systems Laboratory, Department of Electrical and Computer Engineering, University of Massachusetts, 100 Natural Resources Road, Amherst, MA 01003, USA.

Abstract

We present a simple and effective mold cleaning method for nanoimprint lithography. Polydimethylsiloxane (PDMS) prepolymer is spin-coated onto a contaminated imprint mold, thermally cured in an ambient environment, and then peeled off afterwards. Contaminants of 100 s μm to sub-50 nm sizes are effectively cleaned within one cycle. During the cleaning process, a very thin PDMS film (1-2 nm) is uniformly coated onto the mold surface, serving as a protection and anti-sticking layer.

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