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Angew Chem Int Ed Engl. 2013 Jun 24;52(26):6731-4. doi: 10.1002/anie.201300755. Epub 2013 May 10.

The stoichiometry of electroless silicon etching in solutions of V2O5 and HF.

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  • 1Department of Chemistry, West Chester University, West Chester, PA 19383, USA. k.w.kolasinski@wcupa.edu
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