Send to

Choose Destination
See comment in PubMed Commons below
J Nanosci Nanotechnol. 2012 Nov;12(11):8459-66.

Highly conducting phosphorous doped Nc-Si:H thin films deposited at high deposition rate by hot-wire chemical vapor deposition method.

Author information

School of Energy Studies, University of Pune, Pune 411007, India.


In this paper, we report the synthesis of highly conducting phosphorous doped hydrogenated nanocrystalline silicon (nc-Si:H) films at substantially low substrate temperature (200 degrees C) by hot-wire chemical vapor deposition (HW-CVD) method using pure silane (SiH4) and phosphine (PH3) gas mixture without hydrogen dilution. Structural, optical and electrical properties of these films were investigated as a function of PH3 gas-phase ratio. The characterization of these films by low-angle X-ray diffraction, Raman spectroscopy and atomic force microscopy revealed that, the incorporation of phosphorous in nc-Si:H induces an amorphization in the nc-Si:H film structure. Fourier transform infrared spectroscopy analysis indicates that hydrogen predominately incorporated in phosphorous doped n-type nc-Si:H films mainly in di-hydrogen species (Si-H2) and poly-hydrogen (Si-H2)n bonded species signifying that the films become porous, and micro-void rich. We have observed high band gap (1.97-2.37 eV) in the films, though the hydrogen content is low (< 1.4 at.%) over the entire range of PH3 gas-phase ratio studied. Under the optimum deposition conditions, phosphorous doped nc-Si:H films with high dark conductivity (sigma Dark -5.3 S/cm), low charge-carrier activation energy (E(act) - 132 meV) and high band gap (- 2.01 eV), low hydrogen content (- 0.74 at.%) were obtained at high deposition rate (12.9 angstroms/s).

[Indexed for MEDLINE]
PubMed Commons home

PubMed Commons

How to join PubMed Commons

    Supplemental Content

    Loading ...
    Support Center