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Opt Lett. 2012 Dec 15;37(24):5100-2. doi: 10.1364/OL.37.005100.

Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength.

Author information

1
Electron Microscopy and Analysis, Center of Advanced European Studies and Research, Ludwig-Erhard-Allee 2, Bonn 53175, Germany. johannes.overbuschmann@caesar.de

Abstract

Fresnel zone plates are used for imaging at extreme ultraviolet and soft x-ray wavelengths. Fabricating these zone plates is challenging due to small structure sizes (<150  nm) and complex nanostructuring processes. Fabrication techniques such as electron-beam lithography followed by etching and electroplating processes have been developed over the years. We are reporting on the development of a technique incorporating focused gallium ion-beam lithography to fabricate Fresnel zone plates with 120 nm outermost structure size in a process that combines pattern exposure and structure transfer in one single step. The fabricated zone plates were successfully applied in a microscopic setup at λ=13  nm wavelength.

PMID:
23258018
DOI:
10.1364/OL.37.005100

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