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Nano Lett. 2012 Jul 11;12(7):3788-92. doi: 10.1021/nl301702r. Epub 2012 Jun 19.

High-performance single layered WSe₂ p-FETs with chemically doped contacts.

Author information

1
Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, United States.

Abstract

We report high performance p-type field-effect transistors based on single layered (thickness, ∼0.7 nm) WSe(2) as the active channel with chemically doped source/drain contacts and high-κ gate dielectrics. The top-gated monolayer transistors exhibit a high effective hole mobility of ∼250 cm(2)/(V s), perfect subthreshold swing of ∼60 mV/dec, and I(ON)/I(OFF) of >10(6) at room temperature. Special attention is given to lowering the contact resistance for hole injection by using high work function Pd contacts along with degenerate surface doping of the contacts by patterned NO(2) chemisorption on WSe(2). The results here present a promising material system and device architecture for p-type monolayer transistors with excellent characteristics.

PMID:
22697053
DOI:
10.1021/nl301702r

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