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J Synchrotron Radiat. 2012 Mar;19(Pt 2):216-22. doi: 10.1107/S0909049511052320. Epub 2012 Jan 6.

Modular deposition chamber for in situ X-ray experiments during RF and DC magnetron sputtering.

Author information

1
ANKA, Institut für Synchrotronstrahlung, Karlsruher Institut für Technologie, Karlsruhe, Germany. baerbel.krause@kit.edu

Abstract

A new sputtering system for in situ X-ray experiments during DC and RF magnetron sputtering is described. The outstanding features of the system are the modular design of the vacuum chamber, the adjustable deposition angle, the option for plasma diagnostics, and the UHV sample transfer in order to access complementary surface analysis methods. First in situ diffraction and reflectivity measurements during RF and DC deposition of vanadium carbide demonstrate the performance of the set-up.

PMID:
22338682
DOI:
10.1107/S0909049511052320

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