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J Opt Soc Am A Opt Image Sci Vis. 2011 Nov 1;28(11):2218-25. doi: 10.1364/JOSAA.28.002218.

Performance enhancements to absorbance-modulation optical lithography. II. Plasmonic superlenses.

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1
MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Electrical and Computer Engineering, University of Canterbury, Christchurch, New Zealand.

Abstract

The ability to improve the transmission and intensity profiles in absorbance-modulation optical lithography (AMOL) [J. Opt. Soc. Am. A 23, 2290 (2006) and Phys. Rev. Lett. 98, 043905 (2007)] through the introduction of a plasmonic metal layer is investigated. In this part of the work, a plasmonic layer is placed between the absorbance-modulation layer and the photoresist layer. Transmission through this layer is possible due to the ability of thin plasmonic layers to act as near-field analogues of negative refraction materials. The superlens performance is best with a thin layer of 10-20 nm, although this causes a full width at half-maximum increase of ~50%. The introduction of the plasmonic layers allows dichroic filtering of the two wavelengths, with a difference of a factor of 10 in the transmitted intensity ratio, reducing undesirable exposure of the resist. The presented work demonstrates that a plasmonic layer can be interfaced with an AMOL system, but that further optimization and material development are needed to allow substantial performance improvements.

PMID:
22048288
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