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Opt Express. 2011 Sep 26;19(20):19093-103. doi: 10.1364/OE.19.019093.

Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates.

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  • 1School of Integrated Design Engineering, Keio University, 3-14-1, Hiyoshi, Yokohama-shi, 223-8522, Japan.


We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates.

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