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Appl Opt. 2011 Feb 1;50(4):579-85. doi: 10.1364/AO.50.000579.

Fabrication of ellipticity-controlled microlens arrays by controlling the parameters of the multiple-exposure two-beam interference technique.

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Department of Physics, National Chung Cheng University, Ming Hsiung, Chiayi, Taiwan.


We demonstrate a promising method for fabrication of plastic microlens arrays (MLAs) with a controllable ellipticity and structure, by using the combination of multiple-exposure two-beam interference and plastic replication techniques. Multiple exposures of a two-beam interference pattern with a wavelength of 442 nm into a thick positive photoresist (AZ-4620) were used to form different two-dimensional periodic structures. Thanks to the developing effect of the positive photoresist, fabricated structures consisting of hemielliptical- or hemispherical-shaped concave holes were obtained. By controlling the rotation angle between different exposures, both the shape and structure of the holes varied. By adjusting the dosage ratio between different exposures, the shape of the holes was modified while the structure of the holes was unchanged. The photoresist concave microstructures were then transferred to plastic MLAs by employing replication and embossing techniques. The fabricated MLAs were characterized by a scanning electron microscope and atomic force microscope measurements. We show that the ellipticity of the microlenses can be well controlled from 0 (hemispherical) to 0.96 (hemielliptical) by changing the rotation angle or dosage ratio between the two exposures.


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