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Adv Mater. 2011 Feb 1;23(5):634-9. doi: 10.1002/adma.201002999. Epub 2010 Dec 6.

Hierarchical nanostructures by sequential self-assembly of styrene-dimethylsiloxane block copolymers of different periods.

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1
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.

Abstract

Poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) block copolymers with a period as low as 13 nm have been self-assembled on a template formed from PS-b-PDMS of a 34–40 nm period, which is itself templated by micron-scale substrate features prepared using conventional lithography. This hierarchical process provides a simple method for directing the self-assembly of sub-10 nm features and registering them on the substrate.

PMID:
21274911
DOI:
10.1002/adma.201002999
[Indexed for MEDLINE]
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