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Appl Opt. 1988 Sep 15;27(18):3895-7. doi: 10.1364/AO.27.003895.

Advantages of an off-Littrow mounting of an echelle grating.

Abstract

A phenomenon is described in which the size of the exit-slit image of the entrance slit is influenced by the angle at which an echelle grating is used. The phenomenon becomes significant only for large deviations from Littrow conditions. A mathematical treatment and experimental results are presented to show that proper exploitation of the effect results in simultaneous improvements in bandpass, range, and intensity for an echelle spectrometer.

PMID:
20539484
[PubMed]
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