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Lab Chip. 2010 Jul 21;10(14):1774-6. doi: 10.1039/c004124f. Epub 2010 May 21.

Patterning microfluidic device wettability using flow confinement.

Author information

1
School of Engineering and Applied Sciences/Department of Physics, Harvard University, Cambridge, Massachusetts, USA.

Abstract

We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.

PMID:
20490412
DOI:
10.1039/c004124f

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