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Opt Express. 2010 Feb 15;18(4):3850-7. doi: 10.1364/OE.18.003850.

Nanophotonic devices on thin buried oxide Silicon-On-Insulator substrates.

Author information

1
OxideMEMS Lab, School of Electrical and Computer Engineering, Cornell University, Ithaca, NY 14850, USA. ss625@cornell.edu

Abstract

We demonstrate a silicon photonic platform using thin buried oxide silicon-on-insulator (SOI) substrates using localized substrate removal. We show high confinement silicon strip waveguides, micro-ring resonators and nanotapers using this technology. Propagation losses for the waveguides using the cutback method are 3.88 dB/cm for the quasi-TE mode and 5.06 dB/cm for the quasi-TM mode. Ring resonators with a loaded quality factor (Q) of 46,500 for the quasi-TM mode and intrinsic Q of 148,000 for the quasi-TE mode have been obtained. This process will enable the integration of photonic structures with thin buried oxide SOI based electronics.

PMID:
20389395
[Indexed for MEDLINE]

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