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Opt Express. 2010 Feb 15;18(4):3298-310. doi: 10.1364/OE.18.003298.

Near-field ellipsometry for thin film characterization.

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1
Singapore Institute of Manufacturing Technology, 71 Nanyang Drive, 638075, Singapore.

Abstract

A near-field ellipsometry method is presented for nano-scale thin film characterization. The technique fuses the topographic and ellipso-metric optical measurements that are simultaneously obtained by a scanning near-field optical microscopy (SNOM). It is shown that the proposed near-field ellipsometry is able to attain nano-scale lateral resolution and correct artifacts in characterization. The effectiveness of the proposed method is verified by simulation and experimental studies.

PMID:
20389337
[Indexed for MEDLINE]
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