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ACS Nano. 2010 Jan 26;4(1):524-8. doi: 10.1021/nn901496p.

Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films.

Author information

1
Department of Materials Science and Engineering, Rutgers University, 607 Taylor Road, Piscataway, New Jersey 08854, USA.

Abstract

The deposition of atomically thin highly uniform chemically derived graphene (CDG) films on 300 mm SiO(2)/Si wafers is reported. We demonstrate that the very thin films can be lifted off to form uniform membranes that can be free-standing or transferred onto any substrate. Detailed maps of thickness using Raman spectroscopy and atomic force microscopy height profiles reveal that the film thickness is very uniform and highly controllable, ranging from 1-2 layers up to 30 layers. After reduction using a variety of methods, the CDG films are transparent and electrically active with FET devices yielding high mobilities of approximately 15 cm(2)/(V s) and sheet resistance of approximately 1 kOmega/sq at approximately 70% transparency.

PMID:
20050640
DOI:
10.1021/nn901496p

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