Send to

Choose Destination
Opt Lett. 2009 Dec 1;34(23):3680-2. doi: 10.1364/OL.34.003680.

Extreme ultraviolet multilayer mirror with near-zero IR reflectance.

Author information

Philips Research Laboratories, High Tech Campus 4, 5656 AE Eindhoven, The Netherlands.


We have developed a multilayer mirror for extreme ultraviolet (EUV) radiation that has low reflectance for IR radiation at 10.6 mum wavelength. The mirror is based on a multilayer coating comprising alternating layers of diamondlike carbon and silicon, for which we demonstrate an EUV reflectance of up to 49.7%. We have made a functional prototype in which the multilayer coating is included as part of an antireflection coating for IR radiation, resulting in reflectance values of 42.5% and 4.4% for EUV and IR, respectively. The mirror can replace a standard Mo/Si mirror in an EUV lithography tool to form an efficient solution for the suppression of unwanted CO(2) laser radiation.


Supplemental Content

Full text links

Icon for Optical Society of America
Loading ...
Support Center