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Opt Lett. 2009 Dec 1;34(23):3680-2. doi: 10.1364/OL.34.003680.

Extreme ultraviolet multilayer mirror with near-zero IR reflectance.

Author information

1
Philips Research Laboratories, High Tech Campus 4, 5656 AE Eindhoven, The Netherlands. wouter.soer@philips.com

Abstract

We have developed a multilayer mirror for extreme ultraviolet (EUV) radiation that has low reflectance for IR radiation at 10.6 mum wavelength. The mirror is based on a multilayer coating comprising alternating layers of diamondlike carbon and silicon, for which we demonstrate an EUV reflectance of up to 49.7%. We have made a functional prototype in which the multilayer coating is included as part of an antireflection coating for IR radiation, resulting in reflectance values of 42.5% and 4.4% for EUV and IR, respectively. The mirror can replace a standard Mo/Si mirror in an EUV lithography tool to form an efficient solution for the suppression of unwanted CO(2) laser radiation.

PMID:
19953160

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