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Water Sci Technol. 2009;60(10):2471-5. doi: 10.2166/wst.2009.660.

Atomic layer deposited (ALD) TiO(2) and TiO(2-x)-N(x) thin film photocatalysts in salicylic acid decomposition.

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Laboratory of Applied Environmental Chemistry, Department of Environmental Sciences, University of Kuopio, Patteristonkatu 1, FI-50100, Mikkeli, Finland.


Degradation of salicylic acid (SA) with thin film photocatalyst, titanium dioxide (TiO(2)) and nitrogen-doped TiO(2) (TiO(2-x)-N(x)) combined with ultraviolet (UV) radiation was studied. TiO(2) film with thickness of 15 and 65 nm was tested. The TiO(2-x)-N(x) film had thickness of 15 nm on top of TiO(2) (50 nm). Photocatalysts were prepared on glass substrate by atomic layer deposition (ALD) technique. The effect of initial pH (3-10) was studied with SA concentration of 10 mg/l. Decomposition of SA was fastest at pH 6 with both films and the rate was equal at initial pH values 3 and 4.3. However, at higher pH values the non-doped film was more efficient.

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