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Ultramicroscopy. 2009 Oct;109(11):1360-4. doi: 10.1016/j.ultramic.2009.07.005. Epub 2009 Jul 15.

Advanced thin film technology for ultrahigh resolution X-ray microscopy.

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Paul Scherrer Institut, CH-5232 Villigen, Switzerland.

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  • Ultramicroscopy. 2010 Jan;110(2):176.


Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metal organic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10nm in width were resolved.

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