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Opt Express. 2005 Sep 5;13(18):7198-208.

Comprehensive modeling of near-field nano-patterning.

Abstract

Near-field nano-patterning greatly simplifies holographic lithography, but deformations in formed structures are potentially severe. A fast and efficient comprehensive model was developed to predict geometry more rigorously. Numerical results show simple intensity-threshold methods do not accurately predict shape or optical behavior. By modeling sources with partial coherence, unpolarized light, and an angular spectrum, it is shown that standard UV lamps can be used to form 3D structures.

PMID:
19498742
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