Send to

Choose Destination
Nanotechnology. 2009 May 6;20(18):185303. doi: 10.1088/0957-4484/20/18/185303. Epub 2009 Apr 14.

A gas-expanded liquid nanoparticle deposition technique for reducing the adhesion of silicon microstructures.

Author information

Department of Chemical Engineering, Auburn University, Auburn, AL 36849, USA.


A gas-expanded liquid-based nanoparticle deposition technique was integrated with a critical point drying process to modify the surface of polysilicon microstructures in order to reduce the adhesion that ordinarily occurs due to dominant interfacial surface forces. Dodecanethiol-capped gold nanoparticles (AuNPs) were deposited onto arrays of cantilever beams using gas-expanded liquid technology in an effort to increase the surface roughness, thereby reducing the real contact surface area as well as changing the chemical constituents of the contacting areas. Both AuNP-coated and uncoated (native oxide surface) arrays were actuated electrostatically in order to determine the work of adhesion. The results of this study indicate that while cantilever beams with only their native oxide exhibit apparent adhesion energies of about 700 +/- 100 microJ m(-2), cantilever beam arrays coated with AuNPs exhibit an apparent adhesion energy of about 8 microJ m(-2) or less. These results indicate that metallic nanoparticle coatings can be successfully applied to micromachines and provide a drastic reduction in apparent adhesion energy.

[Indexed for MEDLINE]

Supplemental Content

Full text links

Icon for IOP Publishing Ltd.
Loading ...
Support Center