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Rev Sci Instrum. 2009 Jan;80(1):015103. doi: 10.1063/1.3043413.

Rotational UV lithography device for cylindrical substrate exposure.

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1
Faculty of Engineering, Institute for Material Science, University of Kiel, Kaiserstr. 2, 24143 Kiel, Germany.

Abstract

Optical photolithograhy is a well developed technique, which is normally restricted to planar substrates used in microelectronics or microelectromechanical system fabrication. For other applications--e.g., patterning of stents--photolithography would be an attractive alternative to techniques such as laser structuring provided that the planar technique could be adapted to cylindrical geometries. This study presents the development of a three-dimensional UV photolithography exposure method using a synchronizing movement between a planar Cr mask and a circular substrate. This technique was successfully applied to tubes with outer diameters between 1 and 5 mm. A lateral resolution for a 5 microm feature size of 4.8 microm was achieved, which is close to the resolution of 4.6 microm for similar planar films.

PMID:
19191459
DOI:
10.1063/1.3043413
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