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Science. 2008 Aug 15;321(5891):936-9. doi: 10.1126/science.1157626.

Density multiplication and improved lithography by directed block copolymer assembly.

Author information

1
Hitachi Global Storage Technologies, San Jose Research Center, 3403 Yerba Buena Road, San Jose, CA 95135, USA. Ricardo.Ruiz@hitachigst.com

Abstract

Self-assembling materials spontaneously form structures at length scales of interest in nanotechnology. In the particular case of block copolymers, the thermodynamic driving forces for self-assembly are small, and low-energy defects can get easily trapped. We directed the assembly of defect-free arrays of isolated block copolymer domains at densities up to 1 terabit per square inch on chemically patterned surfaces. In comparing the assembled structures to the chemical pattern, the density is increased by a factor of four, the size is reduced by a factor of two, and the dimensional uniformity is vastly improved.

PMID:
18703735
DOI:
10.1126/science.1157626
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