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Nano Lett. 2008 Sep;8(9):2872-7. doi: 10.1021/nl801615c. Epub 2008 Aug 12.

Nanoimprint lithography for nanophotonics in silicon.

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1
Molecular Nanofabrication Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, NL-7500 AE Enschede, The Netherlands.

Abstract

A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.

PMID:
18698727
DOI:
10.1021/nl801615c
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