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Opt Lett. 2008 Jul 1;33(13):1434-6.

Contrast in four-beam-interference lithography.

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School of Electrical and Computer Engineering, Georgia Institute of Technology, 777 Atlantic Drive NW, Atlanta, Georgia 30332-0250, USA.


Specific configurations of four linearly polarized, monochromatic plane waves have previously been shown to be capable of producing interference patterns exhibiting the symmetries inherent in all 14 Bravais lattices. We present (1) the range of possible absolute contrasts, (2) the conditions for unity absolute contrast, and (3) the types of interference patterns possible for configurations of four beams interference that satisfy the uniform contrast condition. Results are presented for three Bravais lattice structures: Base- and face-centered cubic and simple cubic.

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