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Opt Lett. 2008 Jun 15;33(12):1303-5.

Double-layer fabrication scheme for large-area polymeric photonic crystal membrane on silicon surface by multibeam interference lithography.

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Institute for Lasers, Photonics and Biophotonics, State University of New York at Buffalo, Buffalo, NY 14260, USA.


We report on the fabrication of two-dimensional polymeric photonic crystal membranes on the surface of silicon using visible-light multibeam interference lithography. The structures are created by the interference of three beams of a green laser. A polymer buffer layer doped with a Rhodamine B laser dye, interlaid between the lithography layer and the silicon substrate, suppresses the effects of strong reflection and nonradiative absorption of silicon on the interference pattern. Large-area defect-free photonic crystal membranes are experimentally realized on silicon surface.

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