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J Synchrotron Radiat. 2008 Mar;15(Pt 2):170-5. doi: 10.1107/S0909049507063510. Epub 2008 Feb 19.

Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating.

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  • 1Institute of Physics, Academia Sinica, Taipei 115, Taiwan.


The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm.

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