Format

Send to

Choose Destination
See comment in PubMed Commons below
Chem Commun (Camb). 2007 Oct 21;(39):4021-3. Epub 2007 Aug 30.

Inorganic polymer photoresist for direct ceramic patterning by photolithography.

Author information

1
Department of Fine Chemical Engineering and Chemistry, Chungnam National University, Daejeon 305-764, Korea.

Abstract

A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.

PMID:
17912402
DOI:
10.1039/b708480c
PubMed Commons home

PubMed Commons

0 comments
How to join PubMed Commons

    Supplemental Content

    Full text links

    Icon for Royal Society of Chemistry
    Loading ...
    Support Center