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Appl Opt. 2007 Jun 20;46(18):3736-46.

Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography.

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Lawrence Livermore National Laboratory, Livermore, California 94550, USA.


Multilayer coating results are discussed for the primary and secondary mirrors of the micro-exposure tool (MET): a 0.30 NA lithographic imaging system with a 200 microm x 600 microm field of view at the wafer plane, operating in the extreme ultraviolet (EUV) region at an illumination wavelength around 13.4 nm. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates. A velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms demonstrating sub-diffraction-limited performance, as defined by the classical diffraction limit of Rayleigh (0.25 waves peak to valley) or Marechal (0.07 waves rms). This work is an experimental demonstration of sub-diffraction- limited multilayer coatings for high-NA EUV imaging systems, which resulted in the highest resolution microfield EUV images to date.

[Indexed for MEDLINE]

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