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Opt Lett. 2006 Sep 1;31(17):2613-5.

Large-area surface-plasmon polariton interference lithography.

Author information

1
Department of Physics, Sichuan University, Chengdu, China. guoxiaoweihao@163.com

Abstract

Large-area surface-plasmon polariton (SPP) interference lithography is presented, which uses an attenuated total reflection-coupling mode to excite the interference of the SPPs. The interference of the SPPs causes a highly directional intensity range in a finite depth of the electric field, which is good for noncontact. Finite-difference time-domain simulations of the interference on a thin resist layer show that broad-beam illumination with a p-polarized light at a wavelength of 441 nm can produce features as small as 60 nm with high contrast, smaller than lambda/7. Our results illustrate the potential for patterning periodic structures over large areas at low cost.

PMID:
16902636
DOI:
10.1364/ol.31.002613

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