Format

Send to

Choose Destination
See comment in PubMed Commons below
Nano Lett. 2006 Jul;6(7):1454-8.

Fabrication and device characterization of omega-shaped-gate ZnO nanowire field-effect transistors.

Author information

1
Department of Electrical Engineering and Institute for Nano Science, Korea University, Seoul, Korea.

Abstract

Omega-shaped-gate (OSG) nanowire-based field effect transistors (FETs) have attracted a great deal of attention recently, because theoretical simulations predicted that they should have a higher device performance than nanowire-based FETs with other gate geometries. OSG FETs with channels composed of ZnO nanowires were successfully fabricated in this study using photolithographic processes. In the OSG FETs fabricated on oxidized Si substrates, the channels composed of ZnO nanowires with diameters of about 110 nm are coated with Al(2)O(3) using atomic layer deposition, which surrounds the channels and acts as a gate dielectric. About 80% of the surfaces of the nanowires coated with Al(2)O(3) are covered with the gate metal to form OSG FETs. A representative OSG FET fabricated in this study exhibits a mobility of 30.2 cm(2)/ (V s), a peak transconductance of 0.4 muS (V(g) = -2.2 V), and an I(on)/I(off) ratio of 10(7). To the best of our knowledge, the value of the I(on)/I(off) ratio obtained from this OSG FET is higher than that of any of the previously reported nanowire-based FETs. Its mobility, peak transconductance, and I(on)/I(off) ratio are remarkably enhanced by 3.5, 32, and 10(6) times, respectively, compared with a back-gate FET with the same ZnO nanowire channel as utilized in the OSG FET.

PMID:
16834428
DOI:
10.1021/nl060708x
[Indexed for MEDLINE]
PubMed Commons home

PubMed Commons

0 comments
How to join PubMed Commons

    Supplemental Content

    Full text links

    Icon for American Chemical Society
    Loading ...
    Support Center