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Opt Lett. 2003 Nov 15;28(22):2249-51.

Mo:Y multilayer mirror technology utilized to image the near-field output of a Ni-like Sn laser at 11.9 nm.

Author information

1
Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94551, USA. jnilsen@llnl.gov

Abstract

Although bright x-ray sources exist at shorter wavelengths, the development of sophisticated diagnostics with x-ray laser sources has been restricted to wavelengths longer than 12.5 nm because of the limitations of the widely used Mo:Si multilayer mirrors. With the novel Mo:Y multilayer mirrors that we present, many x-ray laser applications can be extended to the 7-12-nm range. We demonstrate this new capability by imaging the near-field output of the Ni-like Sn laser at 11.9 nm.

PMID:
14649957

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