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Opt Lett. 2003 Sep 1;28(17):1534-6.

Hartmann wave-front measurement at 13.4 nm with lambdaEUV/120 accuracy.

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Laboratoire d'Interaction du Rayonnement X avec la Matière, Bâtiment 350, Université Paris-Sud, 91405 Orsay, France.


We report, for the first time to our knowledge, experimental demonstration of wave-front analysis via the Hartmann technique in the extreme ultraviolet range. The reference wave front needed to calibrate the sensor was generated by spatially filtering a focused undulator beam with 1.7- and 0.6-microm-diameter pinholes. To fully characterize the sensor, accuracy and sensitivity measurements were performed. The incident beam's wavelength was varied from 7 to 25 nm. Measurements of accuracy better than lambdaEUV/120 (0.11 nm) were obtained at lambdaEUV = 13.4 nm. The aberrations introduced by an additional thin mirror, as well as wave front of the spatially unfiltered incident beam, were also measured.

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