We report on a novel microellipsometer that uses a spatially filtered high-numerical-aperture (NA) lens for large-angle ellipsometric illumination and high spatial resolution. A radially symmetric ellipsometric signal is achieved with two half-wave plates to produce a pure polarization rotation and a birefringent cube as a radial analyzer. This radial symmetry offers a better signal-to-noise ratio compared with other microellipsometer techniques. Ellipsometric measurement with a spatial resolution of 0.5 microm is performed with a He-Ne (632.8-nm) laser source and an objective lens with an NA of 0.8. Experimental data on SiO2 samples with different thicknesses are in good agreement with spectroscopic ellipsometer results. We acquired ellipsometric images of photoresist microstructure through scanning the sample. Surface profiles of the photoresist microstructure are derived from the ellipsometric data and compared with the results from a stylus profiler.