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Appl Opt. 2002 May 1;41(13):2555-60.

Effect of systematic errors in spectral photometric data on the accuracy of determination of optical parameters of dielectric thin films.

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Research Computing Center, Moscow State University, Vorob'evy Gory, Russia.


The determination of optical parameters of thin films from experimental data is a typical task in the field of optical-coating technology. The optical characterization of a single layer deposited on a substrate with known optical parameters is widely used for this purpose. Results of optical characterization are dependent on not only the choice of the thin-film model but also on the quality of experimental data. The theoretical results presented highlight the effect of systematic errors in measurement data on the determination of thin-film parameters. Application of these theoretical results is illustrated by the analysis of experimental data for magnesium fluoride thin films.


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