This study presents a new nanotechnology application involving an ITO thin-film removal reuse process using an eccentric-form negative electrode, offering a fast removal rate from the surface of liquid crystal displays (LCDs). For the precision removal process, a small amount of eccentricity of the negative electrode or a higher rotational speed of the negative electrode corresponds to a higher etching rate for the ITO. A higher flow velocity of the electrolyte and a higher working temperature also correspond to a higher removal rate. The average effect of the eccentricity is better than the effects of a pulsed current, while the current rating need not be prolonged by the off-time.
Keywords: eccentric-form; liquid crystal display; nanotechnology; reuse-process; thin-film.