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Results: 1 to 20 of 22

1.
2.

Photochemical preparation of silver nanoparticles supported on zeolite crystals.

Zaarour M, El Roz M, Dong B, Retoux R, Aad R, Cardin J, Dufour C, Gourbilleau F, Gilson JP, Mintova S.

Langmuir. 2014 Jun 3;30(21):6250-6. doi: 10.1021/la5006743. Epub 2014 May 20.

PMID:
24810992
3.

Modeling of the electromagnetic field and level populations in a waveguide amplifier: a multi-scale time problem.

Fafin A, Cardin J, Dufour C, Gourbilleau F.

Opt Express. 2013 Oct 7;21(20):24171-84. doi: 10.1364/OE.21.024171.

PMID:
24104327
4.

Microstructure and optical properties of Pr3+-doped hafnium silicate films.

An Y, Labbé C, Khomenkova L, Morales M, Portier X, Gourbilleau F.

Nanoscale Res Lett. 2013 Jan 21;8(1):43. doi: 10.1186/1556-276X-8-43.

5.

Correlation between matrix structural order and compressive stress exerted on silicon nanocrystals embedded in silicon-rich silicon oxide.

Zatryb G, Podhorodecki A, Misiewicz J, Cardin J, Gourbilleau F.

Nanoscale Res Lett. 2013 Jan 21;8(1):40. doi: 10.1186/1556-276X-8-40.

6.

Nanoscale evidence of erbium clustering in Er-doped silicon-rich silica.

Talbot E, Lardé R, Pareige P, Khomenkova L, Hijazi K, Gourbilleau F.

Nanoscale Res Lett. 2013 Jan 21;8(1):39. doi: 10.1186/1556-276X-8-39.

7.

Structural and optical characterization of pure Si-rich nitride thin films.

Debieu O, Nalini RP, Cardin J, Portier X, Perrière J, Gourbilleau F.

Nanoscale Res Lett. 2013 Jan 16;8(1):31. doi: 10.1186/1556-276X-8-31.

8.

Phase transformation in SiOx/SiO₂ multilayers for optoelectronics and microelectronics applications.

Roussel M, Talbot E, Pratibha Nalini R, Gourbilleau F, Pareige P.

Ultramicroscopy. 2013 Sep;132:290-4. doi: 10.1016/j.ultramic.2012.10.013. Epub 2012 Nov 12.

PMID:
23286962
9.

SiOx/SiNy multilayers for photovoltaic and photonic applications.

Nalini RP, Khomenkova L, Debieu O, Cardin J, Dufour C, Carrada M, Gourbilleau F.

Nanoscale Res Lett. 2012 Feb 14;7:124. doi: 10.1186/1556-276X-7-124.

10.

Electromagnetic modeling of waveguide amplifier based on Nd3+ Si-rich SiO2 layers by means of the ADE-FDTD method.

Dufour C, Cardin J, Debieu O, Fafin A, Gourbilleau F.

Nanoscale Res Lett. 2011 Apr 4;6(1):278. doi: 10.1186/1556-276X-6-278.

11.

Atomic scale investigation of silicon nanowires and nanoclusters.

Roussel M, Chen W, Talbot E, Lardé R, Cadel E, Gourbilleau F, Grandidier B, Stiévenard D, Pareige P.

Nanoscale Res Lett. 2011 Mar 30;6(1):271. doi: 10.1186/1556-276X-6-271.

12.

Electrical behavior of MIS devices based on Si nanoclusters embedded in SiOxNy and SiO2 films.

Jacques E, Pichon L, Debieu O, Gourbilleau F.

Nanoscale Res Lett. 2011 Feb 24;6(1):170. doi: 10.1186/1556-276X-6-170.

13.

Hf-based high-k materials for Si nanocrystal floating gate memories.

Khomenkova L, Sahu BS, Slaoui A, Gourbilleau F.

Nanoscale Res Lett. 2011 Feb 24;6(1):172. doi: 10.1186/1556-276X-6-172.

14.

Effect of the Nd content on the structural and photoluminescence properties of silicon-rich silicon dioxide thin films.

Debieu O, Cardin J, Portier X, Gourbilleau F.

Nanoscale Res Lett. 2011 Feb 21;6(1):161. doi: 10.1186/1556-276X-6-161.

15.

Atomic characterization of Si nanoclusters embedded in SiO2 by atom probe tomography.

Roussel M, Talbot E, Gourbilleau F, Pareige P.

Nanoscale Res Lett. 2011 Feb 23;6(1):164. doi: 10.1186/1556-276X-6-164.

16.

New Si-based multilayers for solar cell applications.

Nalini RP, Dufour C, Cardin J, Gourbilleau F.

Nanoscale Res Lett. 2011 Feb 18;6(1):156. doi: 10.1186/1556-276X-6-156.

17.

On the nature of the stretched exponential photoluminescence decay for silicon nanocrystals.

Zatryb G, Podhorodecki A, Misiewicz J, Cardin J, Gourbilleau F.

Nanoscale Res Lett. 2011 Jan 31;6(1):106. doi: 10.1186/1556-276X-6-106.

18.

Preface to Symposium E: Nanoscaled Si, Ge based Materials.

Gourbilleau F, Podhorodecki A.

Nanoscale Res Lett. 2011 Jan 31;6(1):105. doi: 10.1186/1556-276X-6-105. No abstract available.

19.

Temperature dependent emission quenching for silicon nanoclusters.

Podhorodecki A, Zatryb G, Misiewicz J, Gourbilleau F, Dufour C.

J Nanosci Nanotechnol. 2010 Sep;10(9):5648-52.

PMID:
21133086
20.

Thermal stability of high-k Si-rich HfO(2) layers grown by RF magnetron sputtering.

Khomenkova L, Portier X, Cardin J, Gourbilleau F.

Nanotechnology. 2010 Jul 16;21(28):285707. doi: 10.1088/0957-4484/21/28/285707. Epub 2010 Jun 28.

PMID:
20585152
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