Skip to main page content
U.S. flag

An official website of the United States government

Dot gov

The .gov means it’s official.
Federal government websites often end in .gov or .mil. Before sharing sensitive information, make sure you’re on a federal government site.

Https

The site is secure.
The https:// ensures that you are connecting to the official website and that any information you provide is encrypted and transmitted securely.

Access keys NCBI Homepage MyNCBI Homepage Main Content Main Navigation

Search Page

Filters

My NCBI Filters

Results by year

Table representation of search results timeline featuring number of search results per year.

Year Number of Results
2002 1
2009 1
2012 1
2016 2
2018 1
2019 4
2020 1
2021 1
2024 0

Text availability

Article attribute

Article type

Publication date

Search Results

12 results

Results by year

Filters applied: . Clear all
Page 1
Atomic Layer Deposited TiO2 and Al2O3 Thin Films as Coatings for Aluminum Food Packaging Application.
Dias V, Maciel H, Fraga M, Lobo AO, Pessoa R, Marciano FR. Dias V, et al. Materials (Basel). 2019 Feb 25;12(4):682. doi: 10.3390/ma12040682. Materials (Basel). 2019. PMID: 30823576 Free PMC article.
The present study evaluates and compares the electrochemical behavior of the non-coated, commercial resin-coated, TiO2-coated and Al2O3-coated aluminum in commercial beer electrolyte. For this, TiO2 and Al2O3 thin films were deposited on …
The present study evaluates and compares the electrochemical behavior of the non-coated, commercial resin-coated, TiO2-coat …
Corrosion Resistance of Atomic Layer Deposition-Generated Amorphous Thin Films.
Anderson MD, Aitchison B, Johnson DC. Anderson MD, et al. ACS Appl Mater Interfaces. 2016 Nov 9;8(44):30644-30648. doi: 10.1021/acsami.6b11231. Epub 2016 Oct 26. ACS Appl Mater Interfaces. 2016. PMID: 27749042
Atomic layer deposition (ALD) was used to prepare amorphous thin films of Al(2)O(3), Nb(2)O(5), and Ta(2)O(5) on both silicon substrates and aluminum blocks. ...Amorphous Nb(2)O(5) and Ta(2)O(5) films showed no appreciable etching or roughening over th …
Atomic layer deposition (ALD) was used to prepare amorphous thin films of Al(2)O(3), Nb(2)O(5), and Ta(2)O(5) on both s …
Scaling Atomic Layer Deposition to Astronomical Optic Sizes: Low-Temperature Aluminum Oxide in a Meter-Sized Chamber.
Fryauf DM, Phillips AC, Bolte MJ, Feldman A, Tompa GS, Kobayashi NP. Fryauf DM, et al. ACS Appl Mater Interfaces. 2018 Dec 5;10(48):41678-41689. doi: 10.1021/acsami.8b10457. Epub 2018 Nov 26. ACS Appl Mater Interfaces. 2018. PMID: 30418738
Atomic Layer Deposition (ALD) is very attractive for producing optical quality thin films, including transparent barrier films on metal-coated astronomical mirrors. To date, ALD of mirror coatings has been limited to relatively small-sized subst …
Atomic Layer Deposition (ALD) is very attractive for producing optical quality thin films, including transparent barrie …
Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO(2) Coating.
Chiappim W, Testoni G, Miranda F, Fraga M, Furlan H, Saravia DA, Sobrinho ADS, Petraconi G, Maciel H, Pessoa R. Chiappim W, et al. Micromachines (Basel). 2021 May 21;12(6):588. doi: 10.3390/mi12060588. Micromachines (Basel). 2021. PMID: 34063804 Free PMC article.
The chemical, structural, morphological, and optical properties of Al-doped TiO(2) thin films, called TiO(2)/Al(2)O(3) nanolaminates, grown by plasma-enhanced atomic layer deposition (PEALD) on p-type Si <100> and commercial SLG glass were discussed. .. …
The chemical, structural, morphological, and optical properties of Al-doped TiO(2) thin films, called TiO(2)/Al(2)O(3) nanolaminates, grown …
Chemical corrosion protection of optical components using atomic layer deposition.
Du X, Zhang K, Holland K, Tombler T, Moskovits M. Du X, et al. Appl Opt. 2009 Nov 20;48(33):6470-4. doi: 10.1364/AO.48.006470. Appl Opt. 2009. PMID: 19935967
Very thin films deposited using atomic layer deposition (ALD) on aluminum mirrors showed extraordinary resistance toward concentrated alkali solutions, various chemical etchants, and solvents. ...Likewise, large-scale hydrogen bubbling was obser …
Very thin films deposited using atomic layer deposition (ALD) on aluminum mirrors showed extraordinary re …
Investigation of the Corrosion Behavior of Atomic Layer Deposited Al2O3/TiO2 Nanolaminate Thin Films on Copper in 0.1 M NaCl.
Fusco MA, Oldham CJ, Parsons GN. Fusco MA, et al. Materials (Basel). 2019 Feb 24;12(4):672. doi: 10.3390/ma12040672. Materials (Basel). 2019. PMID: 30813487 Free PMC article.
Fifty nanometers of Al2O3 and TiO2 nanolaminate thin films deposited by atomic layer deposition (ALD) were investigated for protection of copper in 0.1 M NaCl using electrochemical techniques. ...The results presented here demonstrate the potential for …
Fifty nanometers of Al2O3 and TiO2 nanolaminate thin films deposited by atomic layer deposition (ALD) were inves …
Sub-10 nm Nanolaminated Al(2)O(3)/HfO(2) Coatings for Long-Term Stability of Cu Plasmonic Nanodisks in Physiological Environments.
Daniel MG, Song J, Ali Safiabadi Tali S, Dai X, Zhou W. Daniel MG, et al. ACS Appl Mater Interfaces. 2020 Jul 15;12(28):31952-31961. doi: 10.1021/acsami.0c06941. Epub 2020 Jun 30. ACS Appl Mater Interfaces. 2020. PMID: 32544317
Cu nanodisk arrays are fabricated using freestanding Au nanohole array films as the physical vapor deposition masks and sub-10 nm nanolaminated coatings composed of alternating Al(2)O(3) and HfO(2) nanolayers are grown on Cu nanodisk arrays by atomic layer …
Cu nanodisk arrays are fabricated using freestanding Au nanohole array films as the physical vapor deposition masks and sub-10 nm nan …
Silicalite-1 Layers as a Biocompatible Nano- and Micro-Structured Coating: An In Vitro Study on MG-63 Cells.
Doubkova M, Nemcakova I, Jirka I, Brezina V, Bacakova L. Doubkova M, et al. Materials (Basel). 2019 Oct 31;12(21):3583. doi: 10.3390/ma12213583. Materials (Basel). 2019. PMID: 31683581 Free PMC article.
Silicalite-1 is a purely siliceous form of zeolite, which does not contain potentially harmful aluminum in its structure as opposed to ZSM-5 aluminosilicate types of zeolite. This paper reports on a study of a silicalite-1 film, deposited on a silicon Si(100) substr …
Silicalite-1 is a purely siliceous form of zeolite, which does not contain potentially harmful aluminum in its structure as opposed t …
Passivation coating on electrospun copper nanofibers for stable transparent electrodes.
Hsu PC, Wu H, Carney TJ, McDowell MT, Yang Y, Garnett EC, Li M, Hu L, Cui Y. Hsu PC, et al. ACS Nano. 2012 Jun 26;6(6):5150-6. doi: 10.1021/nn300844g. Epub 2012 May 7. ACS Nano. 2012. PMID: 22548313
However, the chemical activity of copper nanofibers causes a substantial increase in the sheet resistance after thermal oxidation or chemical corrosion of the nanofibers. In this work, we utilize atomic layer deposition to coat a passivation layer …
However, the chemical activity of copper nanofibers causes a substantial increase in the sheet resistance after thermal oxidation or chemica …
New Chemical Insights into the Beneficial Role of Al(2)O(3) Cathode Coatings in Lithium-ion Cells.
Hall DS, Gauthier R, Eldesoky A, Murray VS, Dahn JR. Hall DS, et al. ACS Appl Mater Interfaces. 2019 Apr 17;11(15):14095-14100. doi: 10.1021/acsami.8b22743. Epub 2019 Apr 3. ACS Appl Mater Interfaces. 2019. PMID: 30916918
Inorganic surface coatings such as Al(2)O(3) are commonly applied on positive electrode materials to improve the cycling stability and lifetime of lithium-ion cells. The beneficial effects are typically attributed to the chemical scavenging of corrosive HF and the p …
Inorganic surface coatings such as Al(2)O(3) are commonly applied on positive electrode materials to improve the cycling stability an …
12 results