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Opt Lett. 2012 Sep 15;37(18):3816-8. doi: 10.1364/OL.37.003816.

Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures.

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  • 1Department of Photonics Engineering, Technical University of Denmark, Lyngby, Denmark.


In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390-785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern.

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