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Results: 1 to 20 of 106

Similar articles for PubMed (Select 24994964)

1.

Aluminum silicide microparticles transformed from aluminum thin films by hypoeutectic interdiffusion.

Noh JS.

Nanoscale Res Lett. 2014 Jun 21;9(1):312. doi: 10.1186/1556-276X-9-312. eCollection 2014.

2.

Self-assembled Al nanoparticles on Si and fused silica, and their application for Si solar cells.

Villesen TF, Uhrenfeldt C, Johansen B, Nylandsted Larsen A.

Nanotechnology. 2013 Jul 12;24(27):275606. doi: 10.1088/0957-4484/24/27/275606. Epub 2013 Jun 14.

PMID:
23764700
3.

Alucone interlayers to minimize stress caused by thermal expansion mismatch between Al₂O₃ films and Teflon substrates.

Jen SH, George SM, McLean RS, Carcia PF.

ACS Appl Mater Interfaces. 2013 Feb;5(3):1165-73. doi: 10.1021/am303077x. Epub 2013 Jan 31.

PMID:
23272996
4.

Comparison of the annealing behavior of thin Ta films deposited onto Si and SiO2 substrates.

Hübner R, Hecker M, Mattern N, Hoffmann V, Wetzig K, Engelmann HJ, Zschech E.

Anal Bioanal Chem. 2004 Jun;379(4):568-75. Epub 2004 Apr 6.

PMID:
15067495
5.

Surface precipitates formed on annealed LSAT (001) single crystal.

Ohashi K, Okada S, Sasaki K, Tokunaga T, Kobayashi S, Yamamoto T.

Microscopy (Oxf). 2014 Nov;63 Suppl 1:i20. doi: 10.1093/jmicro/dfu049.

PMID:
25359813
6.
7.

Rhodium and silicon system: II. Rhodium silicide formation.

Marot L, Schoch R, Steiner R, Thommen V, Mathys D, Meyer E.

Nanotechnology. 2010 Sep 10;21(36):365707. doi: 10.1088/0957-4484/21/36/365707. Epub 2010 Aug 12.

PMID:
20702929
8.

Electrochemical and microstructural study of oxide films formed electrochemically at microcrystalline Al-Fe-V-Si alloys.

Thomas SC, Birss VI, Steele D, Tessier D.

Microsc Res Tech. 1995 Jul 1;31(4):285-92.

PMID:
7549001
9.

Nano-scale surface morphology evolution of Cu/Ti thin films.

Lin QJ, Yang SM, Jing W, Jiang ZD, Wang CY.

J Nanosci Nanotechnol. 2013 Aug;13(8):5665-70.

PMID:
23882814
10.

Shrunk lattice structure and interdiffusion characteristics of 5 nm thick Al(2)O(3) ultrathin films sputtered on silicon.

Li JM.

Nanotechnology. 2008 Jan 23;19(3):035604. doi: 10.1088/0957-4484/19/03/035604. Epub 2007 Dec 11.

PMID:
21817578
11.

Ultrasmooth and thermally stable silver-based thin films with subnanometer roughness by aluminum doping.

Gu D, Zhang C, Wu YK, Guo LJ.

ACS Nano. 2014 Oct 28;8(10):10343-51. doi: 10.1021/nn503577c. Epub 2014 Sep 17.

PMID:
25211394
12.

Aluminium phosphide as a eutectic grain nucleus in hypoeutectic Al-Si alloys.

Nogita K, McDonald SD, Tsujimoto K, Yasuda K, Dahle AK.

J Electron Microsc (Tokyo). 2004;53(4):361-9.

PMID:
15585468
13.

Microstructure and composition of annealed Al/Ti-metallization layers.

Hofmann M, Gemming T, Wetzig K.

Anal Bioanal Chem. 2004 Jun;379(4):547-53. Epub 2004 Apr 22.

PMID:
15103444
14.

The influences of rapid-thermal annealing on the characteristics of Sr0.6Ba0.4Nb2O6 thin film.

Yang CF, Diao CC, Wu CC, Leu CC.

J Nanosci Nanotechnol. 2011 Dec;11(12):10493-7.

PMID:
22408933
15.

Hydrophobicity of perfluoroalkyl isocyanate monolayers on oxidized aluminum surfaces.

Hozumi A, Kim B, McCarthy TJ.

Langmuir. 2009 Jun 16;25(12):6834-40. doi: 10.1021/la804127z.

PMID:
19432482
16.

Effect of microwave annealing temperatures on lead zirconate titanate thin films.

Bhaskar A, Chang HY, Chang TH, Cheng SY.

Nanotechnology. 2007 Oct 3;18(39):395704. doi: 10.1088/0957-4484/18/39/395704. Epub 2007 Sep 4.

PMID:
21730429
17.

Passivation mechanism of thermal atomic layer-deposited Al2O3 films on silicon at different annealing temperatures.

Zhao Y, Zhou C, Zhang X, Zhang P, Dou Y, Wang W, Cao X, Wang B, Tang Y, Zhou S.

Nanoscale Res Lett. 2013 Mar 2;8(1):114. doi: 10.1186/1556-276X-8-114.

18.

Formation of aligned nanosilicide structures in a MBE-grown Au/Si(110) system: a real-time temperature-dependent TEM study.

Bhatta UM, Dash JK, Roy A, Rath A, Satyam PV.

J Phys Condens Matter. 2009 May 20;21(20):205403. doi: 10.1088/0953-8984/21/20/205403. Epub 2009 Apr 24.

PMID:
21825530
20.

Investigation of thermoelectric silicide thin films by means of analytical transmission electron microscopy

Hofman D, Kleint C, Thomas J, Wetzig K.

Ultramicroscopy. 2000 Apr;81(3-4):271-7.

PMID:
10782650
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