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Results: 1 to 20 of 102

Related Citations for PubMed (Select 24786612)

1.

Improvement of Al2O3 films on graphene grown by atomic layer deposition with pre-H2O treatment.

Zheng L, Cheng X, Cao D, Wang G, Wang Z, Xu D, Xia C, Shen L, Yu Y, Shen D.

ACS Appl Mater Interfaces. 2014 May 28;6(10):7014-9. doi: 10.1021/am501690g. Epub 2014 May 7.

PMID:
24786612
2.

Controlled direct growth of Al2O3-doped HfO2 films on graphene by H2O-based atomic layer deposition.

Zheng L, Cheng X, Yu Y, Xie Y, Li X, Wang Z.

Phys Chem Chem Phys. 2015 Feb 7;17(5):3179-85. doi: 10.1039/c4cp04957h. Epub 2014 Dec 18.

PMID:
25519447
3.

Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition.

Edy R, Huang X, Guo Y, Zhang J, Shi J.

Nanoscale Res Lett. 2013 Feb 15;8(1):79. doi: 10.1186/1556-276X-8-79.

4.

Atomic layer deposition ultra-barriers for electronic applications-strategies and implementation.

Carcia PF, McLean RS, Sauer BB, Reilly MH.

J Nanosci Nanotechnol. 2011 Sep;11(9):7994-8.

PMID:
22097518
5.

Low-temperature roll-to-roll atmospheric atomic layer deposition of Al₂O₃ thin films.

Ali K, Choi KH.

Langmuir. 2014 Dec 2;30(47):14195-203. doi: 10.1021/la503406v. Epub 2014 Nov 19.

PMID:
25407477
6.

Atomic layer deposition of amorphous TiO2 on graphene as an anode for Li-ion batteries.

Ban C, Xie M, Sun X, Travis JJ, Wang G, Sun H, Dillon AC, Lian J, George SM.

Nanotechnology. 2013 Oct 25;24(42):424002. doi: 10.1088/0957-4484/24/42/424002. Epub 2013 Sep 25.

PMID:
24067324
7.

Atomic Layer Etching of Al2O3 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and Hydrogen Fluoride.

Lee Y, George SM.

ACS Nano. 2015 Feb 24;9(2):2061-70. doi: 10.1021/nn507277f. Epub 2015 Jan 29.

PMID:
25604976
8.

Characteristics of Al-doped ZnO films grown by atomic layer deposition for silicon nanowire photovoltaic device.

Oh BY, Han JW, Seo DS, Kim KY, Baek SH, Jang HS, Kim JH.

J Nanosci Nanotechnol. 2012 Jul;12(7):5330-5.

PMID:
22966566
9.

Novel ALD-assisted growth of ZnO nanorods on graphene and its Cu2ZnSn(S(x)Se(1-x))4 solar cell application.

Jiao K, Wu X, Duan C, Zhang D, Wang Y, Chen Y.

Phys Chem Chem Phys. 2015 Feb 14;17(6):4757-62. doi: 10.1039/c4cp05399k.

PMID:
25589409
10.

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films.

Haeberle J, Henkel K, Gargouri H, Naumann F, Gruska B, Arens M, Tallarida M, Schmeißer D.

Beilstein J Nanotechnol. 2013 Nov 8;4:732-42. doi: 10.3762/bjnano.4.83. eCollection 2013.

11.

Controlling the crystallinity and roughness of atomic layer deposited titanium dioxide films.

Puurunen RL, Sajavaara T, Santala E, Miikkulainen V, Saukkonen T, Laitinen M, Leskelä M.

J Nanosci Nanotechnol. 2011 Sep;11(9):8101-7.

PMID:
22097537
12.

Fabrication of transferable Al(2)O(3) nanosheet by atomic layer deposition for graphene FET.

Jung H, Park J, Oh IK, Choi T, Lee S, Hong J, Lee T, Kim SH, Kim H.

ACS Appl Mater Interfaces. 2014 Feb 26;6(4):2764-9. doi: 10.1021/am4052987. Epub 2014 Feb 11.

PMID:
24483324
13.

Electrical and optical properties of Al-doped ZnO and ZnAl2O4 films prepared by atomic layer deposition.

Hou Q, Meng F, Sun J.

Nanoscale Res Lett. 2013 Mar 28;8(1):144. doi: 10.1186/1556-276X-8-144.

14.

Seeding atomic layer deposition of alumina on graphene with yttria.

Dahal A, Addou R, Azcatl A, Coy-Diaz H, Lu N, Peng X, de Dios F, Kim J, Kim MJ, Wallace RM, Batzill M.

ACS Appl Mater Interfaces. 2015 Jan 28;7(3):2082-7. doi: 10.1021/am508154n. Epub 2015 Jan 15.

PMID:
25556522
15.

Atomic layer deposition of lithium phosphates as solid-state electrolytes for all-solid-state microbatteries.

Wang B, Liu J, Sun Q, Li R, Sham TK, Sun X.

Nanotechnology. 2014 Dec 19;25(50):504007.

PMID:
25431957
16.

Growth and properties of hafnicone and HfO(2)/hafnicone nanolaminate and alloy films using molecular layer deposition techniques.

Lee BH, Anderson VR, George SM.

ACS Appl Mater Interfaces. 2014 Oct 8;6(19):16880-7. doi: 10.1021/am504341r. Epub 2014 Sep 25.

PMID:
25203487
17.

Laser damage properties of TiO2/Al2O3 thin films grown by atomic layer deposition.

Wei Y, Liu H, Sheng O, Liu Z, Chen S, Yang L.

Appl Opt. 2011 Aug 20;50(24):4720-7. doi: 10.1364/AO.50.004720.

PMID:
21857693
18.

Structural evolution and the control of defects in atomic layer deposited HfO2-Al2O3 stacked films on GaAs.

Kang YS, Kim DK, Jeong KS, Cho MH, Kim CY, Chung KB, Kim H, Kim DC.

ACS Appl Mater Interfaces. 2013 Mar;5(6):1982-9. doi: 10.1021/am302803f. Epub 2013 Mar 8.

PMID:
23438318
19.

Al2O3/TiO2 multilayer passivation layers grown at low temperature for flexible organic devices.

Kwon TS, Moon DY, Moon YK, Kim WS, Park JW.

J Nanosci Nanotechnol. 2012 Apr;12(4):3696-700.

PMID:
22849199
20.

Charge-trapping characteristics of Al2O3/Cu/Al2O3 nanolaminate structures prepared through atomic layer deposition.

Lee BK, Kim SH, Park BK, Lee SS, Hwang JH, Chung TM, Lee YK, Kim CG, An KS.

J Nanosci Nanotechnol. 2011 Jul;11(7):5887-91.

PMID:
22121626
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