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Items: 1 to 20 of 90

1.

Application of three-dimensionally area-selective atomic layer deposition for selectively coating the vertical surfaces of standing nanopillars.

Dong W, Zhang K, Zhang Y, Wei T, Sun Y, Chen X, Dai N.

Sci Rep. 2014 Mar 25;4:4458. doi: 10.1038/srep04458.

2.

A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation.

Kim WH, Minaye Hashemi FS, Mackus AJ, Singh J, Kim Y, Bobb-Semple D, Fan Y, Kaufman-Osborn T, Godet L, Bent SF.

ACS Nano. 2016 Apr 26;10(4):4451-8. doi: 10.1021/acsnano.6b00094. Epub 2016 Mar 15.

PMID:
26950397
3.

Area-selective atomic layer deposition of lead sulfide: nanoscale patterning and DFT simulations.

Lee W, Dasgupta NP, Trejo O, Lee JR, Hwang J, Usui T, Prinz FB.

Langmuir. 2010 May 4;26(9):6845-52. doi: 10.1021/la904122e.

PMID:
20099790
4.

Controlled Synthesis of Pd/Pt Core Shell Nanoparticles Using Area-selective Atomic Layer Deposition.

Cao K, Zhu Q, Shan B, Chen R.

Sci Rep. 2015 Feb 16;5:8470. doi: 10.1038/srep08470.

5.

Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition.

Minaye Hashemi FS, Prasittichai C, Bent SF.

ACS Nano. 2015 Sep 22;9(9):8710-7. doi: 10.1021/acsnano.5b03125. Epub 2015 Jul 24.

PMID:
26181140
6.

Synthesis and stabilization of supported metal catalysts by atomic layer deposition.

Lu J, Elam JW, Stair PC.

Acc Chem Res. 2013 Aug 20;46(8):1806-15. doi: 10.1021/ar300229c. Epub 2013 Mar 12.

PMID:
23480735
7.

Atomic layer deposition and abrupt wetting transitions on nonwoven polypropylene and woven cotton fabrics.

Hyde GK, Scarel G, Spagnola JC, Peng Q, Lee K, Gong B, Roberts KG, Roth KM, Hanson CA, Devine CK, Stewart SM, Hojo D, Na JS, Jur JS, Parsons GN.

Langmuir. 2010 Feb 16;26(4):2550-8. doi: 10.1021/la902830d.

PMID:
19799446
8.
9.

Atomic layer deposition of metal oxides on pristine and functionalized graphene.

Wang X, Tabakman SM, Dai H.

J Am Chem Soc. 2008 Jul 2;130(26):8152-3. doi: 10.1021/ja8023059. Epub 2008 Jun 5.

PMID:
18529002
10.
11.

Improving area-selective molecular layer deposition by selective SAM removal.

Prasittichai C, Pickrahn KL, Hashemi FS, Bergsman DS, Bent SF.

ACS Appl Mater Interfaces. 2014 Oct 22;6(20):17831-6. doi: 10.1021/am504441e. Epub 2014 Oct 7.

PMID:
25290370
12.

Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography.

Jung MH, Lee H.

Nanoscale Res Lett. 2011 Feb 21;6(1):159. doi: 10.1186/1556-276X-6-159.

13.
14.

The controlled deposition of metal oxides onto carbon nanotubes by atomic layer deposition: examples and a case study on the application of V2O4 coated nanotubes in gas sensing.

Willinger MG, Neri G, Bonavita A, Micali G, Rauwel E, Herntrich T, Pinna N.

Phys Chem Chem Phys. 2009 May 21;11(19):3615-22. doi: 10.1039/b821555c. Epub 2009 Mar 30.

PMID:
19421470
15.

Ultrathin-layer chromatography nanostructures modified by atomic layer deposition.

Jim SR, Foroughi-Abari A, Krause KM, Li P, Kupsta M, Taschuk MT, Cadien KC, Brett MJ.

J Chromatogr A. 2013 Jul 19;1299:118-25. doi: 10.1016/j.chroma.2013.05.050. Epub 2013 May 25.

PMID:
23768654
16.

Generation of oxide nanopatterns by combining self-assembly of S-layer proteins and area-selective atomic layer deposition.

Liu J, Mao Y, Lan E, Banatao DR, Forse GJ, Lu J, Blom HO, Yeates TO, Dunn B, Chang JP.

J Am Chem Soc. 2008 Dec 17;130(50):16908-13. doi: 10.1021/ja803186e.

PMID:
19053479
17.

Coating of nanoporous membranes: atomic layer deposition versus sputtering.

Grigoras K, Airaksinen VM, Franssila S.

J Nanosci Nanotechnol. 2009 Jun;9(6):3763-70.

PMID:
19504916
18.

Vanadium oxide sensing layer grown on carbon nanotubes by a new atomic layer deposition process.

Willinger MG, Neri G, Rauwel E, Bonavita A, Micali G, Pinna N.

Nano Lett. 2008 Dec;8(12):4201-4. doi: 10.1021/nl801785b.

PMID:
19367841
19.

Identification and passivation of defects in self-assembled monolayers.

Preiner MJ, Melosh NA.

Langmuir. 2009 Mar 3;25(5):2585-7. doi: 10.1021/la804162a.

PMID:
19437743
20.

Surface modification of a ZnO electron-collecting layer using atomic layer deposition to fabricate high-performing inverted organic photovoltaics.

Kim KD, Lim DC, Hu J, Kwon JD, Jeong MG, Seo HO, Lee JY, Jang KY, Lim JH, Lee KH, Jeong Y, Kim YD, Cho S.

ACS Appl Mater Interfaces. 2013 Sep 11;5(17):8718-23. doi: 10.1021/am402403x. Epub 2013 Aug 28.

PMID:
23951998
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