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Results: 1 to 20 of 171

Similar articles for PubMed (Select 23755609)

1.

A study on the fabrication of nanostructures with high aspect ratio and large area uniformity.

Sun T, Xut Z, Wang S, Zhao W, Wu X, Liu S, Liu W, Peng J, Wang Z, Zhang X, He J.

J Nanosci Nanotechnol. 2013 Mar;13(3):1871-5.

PMID:
23755609
2.

An innovative method for uniform pattern transfer in nanoimprint.

Hocheng H, Hsu WH.

J Nanosci Nanotechnol. 2009 Jul;9(7):4267-72.

PMID:
19916441
3.

UV-nanoimprint lithography: structure, materials and fabrication of flexible molds.

Lan H, Liu H.

J Nanosci Nanotechnol. 2013 May;13(5):3145-72. Review.

PMID:
23858828
4.
5.

Effect of post exposure bake in inorganic electron beam resist and utilizing for nanoimprint mold.

Shizuno M, Taniguchi J, Ogino K, Ishikawa K.

J Nanosci Nanotechnol. 2009 Jan;9(1):562-6.

PMID:
19441350
6.

Deformation of nanostructures on polymer molds during soft UV nanoimprint lithography.

Gilles S, Diez M, Offenhäusser A, Lensen MC, Mayer D.

Nanotechnology. 2010 Jun 18;21(24):245307. doi: 10.1088/0957-4484/21/24/245307. Epub 2010 May 25.

PMID:
20498521
7.

The fabrication scheme of a high resolution and high aspect ratio UV-nanoimprint mold.

Lim K, Wi JS, Nam SW, Park SY, Lee JJ, Kim KB.

Nanotechnology. 2009 Dec 9;20(49):495303. doi: 10.1088/0957-4484/20/49/495303. Epub 2009 Nov 6.

PMID:
19893150
8.

Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media.

Yang X, Xiao S, Hu W, Hwu J, van de Veerdonk R, Wago K, Lee K, Kuo D.

Nanotechnology. 2014 Oct 3;25(39):395301. doi: 10.1088/0957-4484/25/39/395301. Epub 2014 Sep 5.

PMID:
25189432
9.

Wafer-scale patterning of sub-40 nm diameter and high aspect ratio (>50:1) silicon pillar arrays by nanoimprint and etching.

Morton KJ, Nieberg G, Bai S, Chou SY.

Nanotechnology. 2008 Aug 27;19(34):345301. doi: 10.1088/0957-4484/19/34/345301. Epub 2008 Jul 15.

PMID:
21730643
10.

Large area high density sub-20 nm SiO(2) nanostructures fabricated by block copolymer template for nanoimprint lithography.

Park HJ, Kang MG, Guo LJ.

ACS Nano. 2009 Sep 22;3(9):2601-8. doi: 10.1021/nn900701p.

PMID:
19708638
11.

Versatile pattern generation of periodic, high aspect ratio Si nanostructure arrays with sub-50-nm resolution on a wafer scale.

Ho JW, Wee Q, Dumond J, Tay A, Chua SJ.

Nanoscale Res Lett. 2013 Dec 1;8(1):506. doi: 10.1186/1556-276X-8-506.

12.

Fabrication of TiO2 nano-to-microscale structures using UV nanoimprint lithography.

Choi JH, Jo HB, Choi HJ, Lee H.

Nanotechnology. 2013 May 17;24(19):195301. doi: 10.1088/0957-4484/24/19/195301. Epub 2013 Apr 17.

PMID:
23595082
13.

Combined AFM nano-machining and reactive ion etching to fabricate high aspect ratio structures.

Peng P, Shi T, Liao G, Tang Z.

J Nanosci Nanotechnol. 2010 Nov;10(11):7287-90.

PMID:
21137916
14.

Simultaneous fabrication of very high aspect ratio positive nano- to milliscale structures.

Chen LQ, Chan-Park MB, Zhang Q, Chen P, Li CM, Li S.

Small. 2009 May;5(9):1043-50. doi: 10.1002/smll.200801210.

PMID:
19235805
15.

Combined laser interference and photolithography patterning of a hybrid mask mold for nanoimprint lithography.

Ahn S, Choi J, Kim E, Dong KY, Jeon H, Ju BK, Lee KB.

J Nanosci Nanotechnol. 2011 Jul;11(7):6039-43.

PMID:
22121654
16.

Fabrication of SiNx-based photonic crystals on GaN-based LED devices with patterned sapphire substrate by nanoimprint lithography.

Byeon KJ, Cho JY, Kim J, Park H, Lee H.

Opt Express. 2012 May 7;20(10):11423-32. doi: 10.1364/OE.20.011423.

PMID:
22565762
17.
18.

Patterned self-assembly of gold nanoparticles on chemical templates fabricated by soft UV nanoimprint lithography.

Gilles S, Kaulen C, Pabst M, Simon U, Offenhäusser A, Mayer D.

Nanotechnology. 2011 Jul 22;22(29):295301. doi: 10.1088/0957-4484/22/29/295301. Epub 2011 Jun 14.

PMID:
21673378
19.
20.

Fabrication of 150 nm half-pitch grating templates for nanoimprint lithography.

Xie SQ, Lu BR, Sun Y, Chen Y, Qu XP, Liu R.

J Nanosci Nanotechnol. 2009 Feb;9(2):1437-40.

PMID:
19441541
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