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Items: 1 to 20 of 161

1.

Effect of using stencil masks made by focused ion beam milling on permalloy (Ni81Fe19) nanostructures.

Bates JR, Miyahara Y, Burgess JA, Iglesias-Freire O, Grütter P.

Nanotechnology. 2013 Mar 22;24(11):115301. doi: 10.1088/0957-4484/24/11/115301. Epub 2013 Feb 28.

PMID:
23449320
2.

Focused ion beam fabrication of spintronic nanostructures: an optimization of the milling process.

Urbánek M, Uhlír V, Bábor P, Kolíbalová E, Hrncír T, Spousta J, Sikola T.

Nanotechnology. 2010 Apr 9;21(14):145304. doi: 10.1088/0957-4484/21/14/145304. Epub 2010 Mar 10.

PMID:
20215654
3.

Parallel fabrication of sub-50-nm uniformly sized nanoparticles by deposition through a patterned silicon nitride nanostencil.

Yan XM, Contreras AM, Koebel MM, Liddle JA, Somorjai GA.

Nano Lett. 2005 Jun;5(6):1129-34.

PMID:
15943455
4.

Selective etching of focused gallium ion beam implanted regions from silicon as a nanofabrication method.

Han Z, Vehkamäki M, Mattinen M, Salmi E, Mizohata K, Leskelä M, Ritala M.

Nanotechnology. 2015 Jul 3;26(26):265304. doi: 10.1088/0957-4484/26/26/265304. Epub 2015 Jun 11.

PMID:
26062985
5.

A review of focused ion beam technology and its applications in transmission electron microscopy.

Sugiyama M, Sigesato G.

J Electron Microsc (Tokyo). 2004;53(5):527-36. Review.

PMID:
15582961
6.

Infrared spectroscopic and electron microscopic characterization of gold nanogap structure fabricated by focused ion beam.

Han G, Weber D, Neubrech F, Yamada I, Mitome M, Bando Y, Pucci A, Nagao T.

Nanotechnology. 2011 Jul 8;22(27):275202. doi: 10.1088/0957-4484/22/27/275202. Epub 2011 May 20.

PMID:
21597137
7.

Ga(+) beam lithography for nanoscale silicon reactive ion etching.

Henry MD, Shearn MJ, Chhim B, Scherer A.

Nanotechnology. 2010 Jun 18;21(24):245303. doi: 10.1088/0957-4484/21/24/245303. Epub 2010 May 20.

PMID:
20484788
8.

Stencil mask methodology for the parallelized production of microscale mechanical test samples.

Shade PA, Kim SL, Wheeler R, Uchic MD.

Rev Sci Instrum. 2012 May;83(5):053903. doi: 10.1063/1.4720944.

PMID:
22667629
9.

Focused ion beam milling and ultramicrotomy of mineralised ivory dentine for analytical transmission electron microscopy.

Jantou V, Turmaine M, West GD, Horton MA, McComb DW.

Micron. 2009 Jun;40(4):495-501. doi: 10.1016/j.micron.2008.12.002. Epub 2008 Dec 24.

PMID:
19157888
10.

Compliant membranes improve resolution in full-wafer micro/nanostencil lithography.

Sidler K, Villanueva LG, Vazquez-Mena O, Savu V, Brugger J.

Nanoscale. 2012 Feb 7;4(3):773-8. doi: 10.1039/c2nr11609j. Epub 2011 Dec 14.

PMID:
22170588
11.

Fabrication of nickel nanocontacts using nanostencils and electron beam assisted SiO2 deposition.

Langford RM, Wang TX.

J Nanosci Nanotechnol. 2006 Aug;6(8):2468-73.

PMID:
17037857
12.
14.

The fabrication of silicon nanostructures by focused-ion-beam implantation and TMAH wet etching.

Sievilä P, Chekurov N, Tittonen I.

Nanotechnology. 2010 Apr 9;21(14):145301. doi: 10.1088/0957-4484/21/14/145301. Epub 2010 Mar 10.

PMID:
20215652
15.

Direct and transmission milling of suspended silicon nitride membranes with a focused helium ion beam.

Marshall MM, Yang J, Hall AR.

Scanning. 2012 Mar-Apr;34(2):101-6. doi: 10.1002/sca.21003. Epub 2012 Feb 13.

PMID:
22331671
16.

Scalable and number-controlled synthesis of carbon nanotubes by nanostencil lithography.

Choi J, Koh K, Kim J.

Nanoscale Res Lett. 2013 Jun 11;8(1):281. doi: 10.1186/1556-276X-8-281.

17.

A Nanoscale-Localized Ion Damage Josephson Junction Using Focused Ion Beam and Ion Implanter.

Wu CH, Ku WS, Jhan FJ, Chen JH, Jeng JT.

J Nanosci Nanotechnol. 2015 May;15(5):3728-32.

PMID:
26504998
18.

Fabrication of platinum nanopillars on peptide-based soft structures using a focused ion beam.

Joshi KB, Singh P, Verma S.

Biofabrication. 2009 Jun;1(2):025002. doi: 10.1088/1758-5082/1/2/025002. Epub 2009 Jun 10.

PMID:
20811102
19.

Combining focused ion beam and atomic layer deposition in nanostructure fabrication.

Han Z, Vehkamäki M, Leskelä M, Ritala M.

Nanotechnology. 2014 Mar 21;25(11):115302. doi: 10.1088/0957-4484/25/11/115302. Epub 2014 Feb 20.

PMID:
24556713
20.

Two-dimensional and 3-dimensional analysis of bone/dental implant interfaces with the use of focused ion beam and electron microscopy.

Giannuzzi LA, Phifer D, Giannuzzi NJ, Capuano MJ.

J Oral Maxillofac Surg. 2007 Apr;65(4):737-47.

PMID:
17368372
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