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Results: 1 to 20 of 228

1.

Effect of the initial structure on the electrical property of crystalline silicon films deposited on glass by hot-wire chemical vapor deposition.

Chung YB, Lee SH, Bae SH, Park HK, Jung JS, Hwang NM.

J Nanosci Nanotechnol. 2012 Jul;12(7):5947-51.

PMID:
22966686
[PubMed]
2.

N-type crystalline silicon films free of amorphous silicon deposited on glass by HCl addition using hot wire chemical vapour deposition.

Chung YB, Park HK, Lee SH, Song JH, Hwang NM.

J Nanosci Nanotechnol. 2011 Sep;11(9):8242-5.

PMID:
22097562
[PubMed]
3.

Structural evolution of nanocrystalline silicon thin films synthesized in high-density, low-temperature reactive plasmas.

Cheng Q, Xu S, Ostrikov KK.

Nanotechnology. 2009 May 27;20(21):215606. doi: 10.1088/0957-4484/20/21/215606. Epub 2009 May 6.

PMID:
19423937
[PubMed - indexed for MEDLINE]
5.

Deposition of thermal and hot-wire chemical vapor deposition copper thin films on patterned substrates.

Papadimitropoulos G, Davazoglou D.

J Nanosci Nanotechnol. 2011 Sep;11(9):8237-41.

PMID:
22097561
[PubMed]
6.

Effect of multi-polar magnetic field on the properties of nanocrystalline silicon thin film deposited by internal-type inductively coupled plasma.

Kim HB, Lee HC, Kim KN, Kang SK, Yeom GY.

J Nanosci Nanotechnol. 2009 Dec;9(12):7440-5.

PMID:
19908805
[PubMed]
7.

Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon.

Ben Slama S, Hajji M, Ezzaouia H.

Nanoscale Res Lett. 2012 Aug 17;7(1):464. doi: 10.1186/1556-276X-7-464.

PMID:
22901341
[PubMed]
Free PMC Article
8.

Annealing effects on capacitance-voltage characteristics of a-Si/SiN(x) multilayer prepared using hot-wire chemical vapour deposition.

Panchal AK, Rai DK, Solanki CS.

J Nanosci Nanotechnol. 2011 Apr;11(4):3414-7.

PMID:
21776718
[PubMed - indexed for MEDLINE]
9.

Effect on thickness of Al layer in poly-crystalline Si thin films using aluminum(Al) induced crystallization method.

Jeong C, Na HS, Lee SH.

J Nanosci Nanotechnol. 2011 Feb;11(2):1350-3.

PMID:
21456186
[PubMed]
10.

Photoluminescence of silicon nanocrystals embedded in silicon oxide.

Wong CK, Wong H, Filip V.

J Nanosci Nanotechnol. 2009 Feb;9(2):1272-6.

PMID:
19441504
[PubMed]
11.

Investigation of thermal and hot-wire chemical vapor deposition copper thin films on TiN substrates using CupraSelect as precursor.

Papadimitropoulos G, Davazoglou D.

J Nanosci Nanotechnol. 2011 Sep;11(9):8169-73.

PMID:
22097549
[PubMed]
12.

[Bonding structure in silicon nitride thin films containing silicon nano-particles].

Ding WG, Yu W, Yang YB, Zhang JY, Fu GS.

Guang Pu Xue Yu Guang Pu Fen Xi. 2006 Oct;26(10):1798-801. Chinese.

PMID:
17205723
[PubMed]
13.

Nanocomposite metal amorphous-carbon thin films deposited by hybrid PVD and PECVD technique.

Teixeira V, Soares P, Martins AJ, Carneiro J, Cerqueira F.

J Nanosci Nanotechnol. 2009 Jul;9(7):4061-6.

PMID:
19916409
[PubMed]
14.

High pressure growth of nanocrystalline silicon films.

Kumar S, Gope J, Kumar A, Parashar A, Rauthan CM, Dixit PN.

J Nanosci Nanotechnol. 2008 Aug;8(8):4211-7.

PMID:
19049205
[PubMed]
15.

Characterization of intrinsic a-Si:H films prepared by inductively coupled plasma chemical vapor deposition for solar cell applications.

Jeong C, Boo S, Jeon M, Kamisako K.

J Nanosci Nanotechnol. 2007 Nov;7(11):4169-73.

PMID:
18047144
[PubMed - indexed for MEDLINE]
16.

Characteristics of Al-doped ZnO films grown by atomic layer deposition for silicon nanowire photovoltaic device.

Oh BY, Han JW, Seo DS, Kim KY, Baek SH, Jang HS, Kim JH.

J Nanosci Nanotechnol. 2012 Jul;12(7):5330-5.

PMID:
22966566
[PubMed]
17.

Improved amorphous/crystalline silicon interface passivation for heterojunction solar cells by low-temperature chemical vapor deposition and post-annealing treatment.

Wang F, Zhang X, Wang L, Jiang Y, Wei C, Xu S, Zhao Y.

Phys Chem Chem Phys. 2014 Aug 27;16(37):20202-20208.

PMID:
25138166
[PubMed - as supplied by publisher]
18.

Effect of annealing treatments on photoluminescence and charge storage mechanism in silicon-rich SiNx:H films.

Sahu BS, Delachat F, Slaoui A, Carrada M, Ferblantier G, Muller D.

Nanoscale Res Lett. 2011 Feb 28;6(1):178. doi: 10.1186/1556-276X-6-178.

PMID:
21711712
[PubMed]
Free PMC Article
19.

Photocatalytic TiO(2) deposition by chemical vapor deposition.

Byun D, Jin Y, Kim B, Kee Lee J, Park D.

J Hazard Mater. 2000 Apr 3;73(2):199-206.

PMID:
10708893
[PubMed - indexed for MEDLINE]
20.

Growth of TiO2 anti-reflection layer on textured Si (100) wafer substrate by metal-organic chemical vapor deposition method.

Nam SH, Choi JW, Cho SJ, Kimt KS, Boo JH.

J Nanosci Nanotechnol. 2011 Aug;11(8):7315-8.

PMID:
22103185
[PubMed]

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