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Results: 1 to 20 of 98

Similar articles for PubMed (Select 22849193)

1.

Effect of precursor ratio on the structural properties of ZnO thin films deposited by low pressure MOCVD.

Kang HM, Jeong JH, Park JK, Lee KS, Kim WM, Choi HJ, Baik YJ.

J Nanosci Nanotechnol. 2012 Apr;12(4):3669-72.

PMID:
22849193
2.

Spatial atomic layer deposition of zinc oxide thin films.

Illiberi A, Roozeboom F, Poodt P.

ACS Appl Mater Interfaces. 2012 Jan;4(1):268-72. doi: 10.1021/am2013097. Epub 2011 Dec 29.

PMID:
22171693
3.

Atomic layer deposition of undoped and Al-doped ZnO thin films using the Zn alkoxide precursor methylzinc isopropoxide.

An KS, Cho W, Lee BK, Lee SS, Kim CG.

J Nanosci Nanotechnol. 2008 Sep;8(9):4856-9.

PMID:
19049124
4.

Preferential growth of ZnO thin films by the atomic layer deposition technique.

Pung SY, Choy KL, Hou X, Shan C.

Nanotechnology. 2008 Oct 29;19(43):435609. doi: 10.1088/0957-4484/19/43/435609. Epub 2008 Sep 22.

PMID:
21832704
5.

Study of the properties of ZnO:Zn thin films obtained from ZnO/Zn/ZnO structure deposited by DC sputtering.

Vasquez-A MA, Goiz O, Baca-Arroyo R, Andraca-Adame JA, Romero-Paredes G, Peña-Sierra R.

J Nanosci Nanotechnol. 2012 Dec;12(12):9234-7.

PMID:
23447983
6.

Effect of bath temperature on the properties of nanocrystalline ZnO thin films.

Pawar SM, Gurav KV, Shin SW, Choi DS, Kim IK, Lokhande CD, Rhee JI, Kim JH.

J Nanosci Nanotechnol. 2010 May;10(5):3412-5.

PMID:
20358968
7.
8.

Growth of TiO2 anti-reflection layer on textured Si (100) wafer substrate by metal-organic chemical vapor deposition method.

Nam SH, Choi JW, Cho SJ, Kimt KS, Boo JH.

J Nanosci Nanotechnol. 2011 Aug;11(8):7315-8.

PMID:
22103185
9.

Structural, electrical, and optical properties of Na-doped ZnO thin films deposited by pulsed laser deposition.

Shan FK, Liu GX, Lee WJ, Bae KR, Shin BC, Kim HS.

J Nanosci Nanotechnol. 2008 Oct;8(10):5203-7.

PMID:
19198421
10.

On the role of tin doping in InOx thin films deposited by radio frequency-plasma enhanced reactive thermal evaporation.

Amaral A, Brogueira P, Lavareda G, de Carvalho CN.

J Nanosci Nanotechnol. 2010 Apr;10(4):2713-6.

PMID:
20355489
11.

Textured tetragonal ZrO2 film grown on (100) silicon surface by DLI metal-organic chemical vapor deposition.

Jouili M, Andrieux M, Ribot P, Ghysel-Herbst M, Ji V.

J Nanosci Nanotechnol. 2011 Sep;11(9):8009-16.

PMID:
22097521
12.

Transparent conducting oxides: texture and microstructure effects on charge carrier mobility in MOCVD-derived CdO thin films grown with a thermally stable, low-melting precursor.

Metz AW, Ireland JR, Zheng JG, Lobo RP, Yang Y, Ni J, Stern CL, Dravid VP, Bontemps N, Kannewurf CR, Poeppelmeier KR, Marks TJ.

J Am Chem Soc. 2004 Jul 14;126(27):8477-92.

PMID:
15238005
13.
14.

Synthesis of TaZnO thin films using combinatorial magnetron sputtering and its electrical, structural and optical properties.

Park JC, Heo GS, Lee JH, Kim HS, Kim TW.

J Nanosci Nanotechnol. 2012 Jul;12(7):5303-6.

PMID:
22966561
15.

The influence of the ethanol-water molar ratio in the precursor solution on morphology and photocatalytic activity of pyrolytic ZnO films.

Quintana M, Rodríguez J, Solis J, Estrada W.

Photochem Photobiol. 2005 Jul-Aug;81(4):783-8.

PMID:
15649109
16.

Analysis of SAW properties of epitaxial ZnO films grown on R-Al2O3 substrates.

Emanetoglu NW, Patounakis G, Liang S, Gorla CR, Wittstruck R, Lu Y.

IEEE Trans Ultrason Ferroelectr Freq Control. 2001 Sep;48(5):1389-94.

PMID:
11570764
17.

Synthesis and conductivity enhancement of Al-doped ZnO nanorod array thin films.

Hsu CH, Chen DH.

Nanotechnology. 2010 Jul 16;21(28):285603. doi: 10.1088/0957-4484/21/28/285603. Epub 2010 Jun 18.

PMID:
20562490
18.

Electrical and optical properties of Al-doped ZnO and ZnAl2O4 films prepared by atomic layer deposition.

Hou Q, Meng F, Sun J.

Nanoscale Res Lett. 2013 Mar 28;8(1):144. doi: 10.1186/1556-276X-8-144.

19.

Atomic layer deposition of tungsten(III) oxide thin films from W2(NMe2)6 and water: precursor-based control of oxidation state in the thin film material.

Dezelah CL 4th, El-Kadri OM, Szilágyi IM, Campbell JM, Arstila K, Niinistö L, Winter CH.

J Am Chem Soc. 2006 Aug 2;128(30):9638-9.

PMID:
16866511
20.

[Study of transmittance of ZnO film deposited on different substrate].

Yuan GC, Xu Z, Zhang FJ, Wang Y, Zhao DW, Xu HH.

Guang Pu Xue Yu Guang Pu Fen Xi. 2007 Jul;27(7):1263-6. Chinese.

PMID:
17944390
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